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SEMI International Standards Publications List
The following standards are available for download.
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SEMI C10-1109 (Reapproved 1114)
Guide for Determination of Method Detection Limits
Specification for Product Time Measurement
Equipment Automation Software
Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection
Guide for Measurement of Roughness of Planar Surfaces on Polished Wafers
Guide for the Measurement of Trace Metal Contamination on Silicon Wafer Surface by Inductively Coupled Plasma Mass Spectrometry
Subordinate documents that are not independent in nature are grouped and sold with the main document (i.e., SEMI M1.1, SEMI M1.2, etc. are available as a package with SEMI M1).
All documents are required to be ballotted for re-approval every 5 years. If there are no technical changes to the documents, the designation remains the same with a comment added stating the month and year it was re-approved. Re-approvals may contain minor editorial changes. If so, the sections that were editorially changed are listed in the abstract for the document.
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