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SEMI P44-1216 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
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Status
CURRENT - Supported by the technical committee.


Abstract

This Standard was technically approved by the Micropatterning Global Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 8, 2016. Available at www.semiviews.org and www.semi.org in December 2016; originally published November 2005; previously published March 2016.

 

This Document defines the common mask data format specifications based on OASIS for mask tools, namely "OASIS.MASK".

 

OASIS.MASK specification applies to the input data format for mask tools.


Referenced SEMI Standards

SEMI P39 — Specification for OASIS® – Open Artwork System Interchange Standard


Revision History

SEMI P44-1216 (technical revision)

SEMI P44-0316 (technical revision)

SEMI P44-0211 (technical revision)

SEMI P44-0709 (technical revision)

SEMI P44-0708 (technical revision)

SEMI P44-1105 (first published)


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