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SEMI F63-0213 - Guide for Ultrapure Water Used in Semiconductor Processing

Volume(s): Facilities
Language: English
Type: Single Standards Download (.pdf)
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Status
CURRENT - Supported by the technical committee.


Abstract

This Standard was technically approved by the global Liquid Chemicals Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 20, 2012. Available at www.semiviews.org and www.semi.org in February 2013; originally published July 2001; previously published February 2011.

 

This Guide may be used:

  • To establish performance criteria when purchasing ultrapure water (UPW) purification equipment.

  • To set the process control parameters for UPW-system operation.

  • To establish quality expectations for the supplied UPW.

 

UPW is used extensively in the production of semiconductor devices for all wet-processing steps (including wafer rinsing). UPW purity is therefore critical to the manufacture of semiconductors. This Guide provides UPW quality parameters and background information for the decision-making process related to new or retrofit facilities that manufacture semiconductors with line widths of 65 nm and smaller.

 

The goal of members of the International Technology Roadmap for Semiconductors (ITRS) UPW committee is to look years ahead on a continual basis to assess the semiconductor industry’s future UPW technology requirements. In addition to ITRS input, the SEMI committee contributed its knowledge of the feasibility and cost viability of the technical solutions required to support UPW quality values specified in this Guide.

 

The information in this Guide has been developed from the following sources:

  • ITRS risk assessment with input from facility- and manufacturing-experts and technology providers in the semiconductor manufacturing industry.

  • The results of UPW testing at semiconductor manufacturing sites as measured by independent laboratories that test high purity water for the semiconductor industry.

  • Specifications from water-system equipment manufacturers.

  • Input from UPW producers and users at SEMI Standards committee meetings, and also through the balloting process.


Referenced SEMI Standards

SEMI C1 — Guide for the Analysis of Liquid Chemicals

SEMI C10 — Guide for the Determination of Method Detection Limits

SEMI F61 — Guide For Ultrapure Water System Used in Semiconductor Processing


Revision History

SEMI F63-0213 (technical revision)

SEMI F63-0211 (technical revision)

SEMI F63-0309 (technical revision)

SEMI F63-0701 (first published)


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