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SEMI Downloads
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Volumes(s): 3D-IC
Language: English
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SEMI 3D1-0912 - Terminology for Through Silicon via Geometrical Metrology |
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SEMI Standards Copyright Policy/License Agreements |
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Status |
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CURRENT - Supported by the technical committee. |
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Abstract |
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This Standard was technically approved by the global
3DS-IC Technical Committee. This edition was approved for publication by the
global Audits and Reviews Subcommittee on August 30, 2012. Available at
www.semiviews.org and www.semi.org in September 2012.
Clear and commonly accepted definitions are needed for
efficient communication and to prevent misunderstanding between buyers and
vendors of metrology equipment and manufacturing services. The purpose of this
Document is to provide a consistent terminology for the understanding and
discussion of metrology issues important to through silicon vias
(TSV).
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Referenced SEMI Standards |
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SEMI E89 —
Guide for Measurement System Analysis (MSA)
SEMI P35 —
Terminology for Microlithography Metrology
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Revision History: |
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SEMI 3D1-0912
(first published)
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