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SEMI PV28-0212 - Test Methods for Measuring Resistivity or Sheet Resistance with a Single-Sided Noncontact Eddy-Current Gauge

Volume(s): Photovoltaic
Language: English
Type: Single Standards Download (.pdf)
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Status
CURRENT - Supported by the technical committee.


Abstract

This Standard was technically approved by the global Photovoltaic – Materials Technical Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on December 24, 2011. Available at www.semiviews.org and www.semi.org in February 2012.

 

Resistivity is a primary quantity for characterization and specification of material used for photovoltaic devices. Sheet resistance is a primary quantity for characterization, specification, and monitoring of thin films. An eddy-current gauge directly measures conductance of a specimen. Values of resistivity or sheet resistance are calculated from the measured conductance, with the resistivity values also requiring a measurement of specimen thickness.

 

These test methods outline the principles of eddy-current measurements as they relate to silicon bricks and ingots or silicon films on nonconductive substrates that are used in photovoltaic sensors. These test methods are very similar to those in SEMI MF673, which covers the principles of eddy-current measurements as they relate to silicon wafers and certain thin films fabricated on such substrates, but the nature of the apparatus is significantly different to accommodate the bricks and ingots. Such an instrument can also be used for measurements on thin silicon or other thin conducting films on nonconductive substrates. SEMI MF673 should be referred to for measurements on silicon wafers and certain thin films fabricated on such substrates.


Referenced SEMI Standards

SEMI M59 — Terminology for Silicon Technology

SEMI MF43 — Test Methods for Measuring Resistivity of Semiconductor Materials

SEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe

SEMI MF374 — Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-Implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure

SEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers

SEMI MF673 — Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge

SEMI MF1527 — Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon


Revision History

SEMI PV28-0212 (first published)


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