Welcome to SEMI

SEMI International Standards

SEMI MF673-1105 (Reapproved 0611) - Test Method for Measuring Resistivity of Semiconductor Wafers or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gauge

Volume(s): Silicon Materials & Process Control
Language: English
Type: Single Standards Download (.pdf)
SEMI Standards Copyright Policy/License Agreements
Bookmark and Share
 
$150.00



Status
CURRENT - Supported by the technical committee.


Abstract

This Standard was technically approved by the global Silicon Wafer Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on May 13, 2011. Available at www.semiviews.org and www.semi.org in June 2011; Original edition published by ASTM International as ASTM F673-80; previously published November 2005.

 

Resistivity is a primary quantity for characterization and specification of material used for semiconductor electronic devices. Sheet resistance is a primary quantity for characterization, specification, and monitoring of thin film fabrication processes.

 

These test methods outline the principles of eddy-current measurements as they relate to semiconductor substrates and certain thin films fabricated on such substrates as well as requirements for setting up and calibrating such instruments for use particularly at a buyer-seller interface.

 

An eddy-current instrument directly measures conductance of a specimen. Values of sheet resistance and resistivity are calculated from the measured conductance, with the resistivity values also requiring a measurement of specimen thickness.

 


Referenced SEMI Standards

SEMI M59 — Terminology for Silicon Technology

SEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers

SEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe

SEMI MF374 — Test Method for Sheet Resistance of Silicon Epitaxial, Diffused, Polysilicon, and Ion-Implanted Layers Using an In-Line Four-Point Probe with the Single-Configuration Procedure

SEMI MF533 — Test Method for Thickness and Thickness Variation of Silicon Wafers

SEMI MF1527 — Guide for Application of Certified Reference Materials and Reference Wafers for Calibration and Control of Instruments for Measuring Resistivity of Silicon

 


Revision History

SEMI MF673-1105 (Reapproved 0611)

SEMI MF673-1105 (technical revision)

SEMI MF673-02 (first SEMI publication)


Related Products
Need Access to all SEMI Standards?
Check out SEMIViews our web-based APP.