Welcome to SEMI

SEMI International Standards

SEMI P44-0211 - Specification for Open Artwork System Interchange Standard (OASIS ®) Specific to Mask Tools

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
SEMI Standards Copyright Policy/License Agreements
Bookmark and Share
 
$150.00



Status
CURRENT - Supported by the technical committee.


Abstract

This Standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits & Reviews Subcommittee on December 21, 2010. Available at www.semiviews.org and www.semi.org in February 2011; originally published November 2005; previously published July 2009.

 

This document defines the common mask data format specifications based on OASIS for mask tools, namely “OASIS.MASK”.

 


Referenced SEMI Standards

SEMI P39 — OASIS®Open Artwork System Interchange Standard


Revision History

SEMI P44-0211 (technical revision)

SEMI P44-0709 (technical revision)

SEMI P44-0708 (technical revision)

SEMI P44-1105 (first published)


Related Products
Need Access to all SEMI Standards?
Check out SEMIViews our web-based APP.