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SEMI Downloads
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Volumes(s): Microlithography
Language: English
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SEMI P39-0308 - OASIS (TM) - Open Artwork System Interchange Standard |
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SEMI Standards Copyright Policy/License Agreements |
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Status |
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CURRENT - Supported by the technical committee. |
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Abstract |
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This standard was technically approved by the global Micropatterning
Committee. This edition was approved for publication by the global Audits and
Reviews Subcommittee on January 18, 2008. It was available at www.semi.org in
February 2008. Originally published March 2004; previously published November
2005.
The purpose of this specification is to define an interchange and
encapsulation format for hierarchical integrated circuit mask layout
information. |
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Referenced SEMI Standards |
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None.
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Revision History: |
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SEMI P39-0308 (technical revision)
SEMI P39-1105 (technical revision)
SEMI P39-0304E2 (editorial revision)
SEMI P39-0304E (editorial revision)
SEMI P39-0304 (first published) |
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