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SEMI M1-0812 - Specification for Polished Single Crystal Silicon Wafers

Volume(s): Materials
Language: English
Type: Single Standards Download (.pdf)
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Referenced SEMI Standards

SEMI M6 — Specification for Silicon Wafers for Use as Photovoltaic Solar Cells

SEMI M8 — Specification for Polished Monocrystalline Silicon Test Wafers

SEMI M12 — Specification for Serial Alphanumeric Marking of the Front Surface of Wafers

SEMI M13 — Specification for Alphanumeric Marking of Silicon Wafers

SEMI M16 — Specification for Polycrystalline Silicon

SEMI M18 — Guide for Developing Specification Forms for Order Entry of Silicon Wafers

SEMI M20 — Practice for Establishing a Wafer Coordinate System

SEMI M24 — Specification for Polished Monocrystalline Silicon Premium Wafers

SEMI M26 — Guide for the Re-Use of 100, 125, 150, and 200 mm Wafer Shipping Boxes Used to Transport Wafers

SEMI M33 — Test Method for the Determination of Residual Surface Contamination on Silicon Wafers by Means of Total Reflection X-Ray Fluorescence Spectroscopy (TXRF)

SEMI M35 — Guide for Developing Specifications for Silicon Wafer Surface Features Detected by Automated Inspection

SEMI M38 — Specification for Polished Reclaimed Silicon Wafers

SEMI M40 — Guide for Measurement of Roughness of Planar Surfaces on Silicon Wafers

SEMI M41 — Specification of Silicon-on-Insulator (SOI) for Power Device/ICs

SEMI M43 — Guide for Reporting Wafer Nanotopography

SEMI M44 — Guide to Conversion Factors for Interstitial Oxygen in Silicon

SEMI M45 — Specification for 300 mm Wafer Shipping System

SEMI M53 — Practice for Calibrating Scanning Surface Inspection Systems Using Certified Depositions of Monodisperse Reference Spheres on Unpatterned Semiconductor Wafer Surfaces

SEMI M57 — Guide for Specifying Silicon Annealed Wafers

SEMI M58 — Test Method for Evaluating DMA-Based Particle Deposition Systems and Processes

SEMI M59 — Terminology for Silicon Technology

SEMI M61 — Specification for Silicon Epitaxial Wafers with Buried Layers

SEMI M62 — Specifications for Silicon Epitaxial Wafers

SEMI M67 — Practice for Determining Wafer Near-Edge Geometry from a Measured Thickness Data Array Using the ESFQR, ESFQD and ESBIR Metrics

SEMI M68 — Practice for Determining Wafer Near-Edge Geometry from a Measured Height Data Array Using a Curvature Metric, ZDD

SEMI M70 — Practice for Determining Wafer-Near-Edge Geometry Using Partial Wafer Site Flatness

SEMI M71 — Specification for Silicon-on-Insulator (SOI) Wafers for CMOS LSI

SEMI M73 — Test Methods for Extracting Relevant Characteristics from Measured Wafer Edge Profiles

SEMI M77 — Practice for Determining Wafer Near-Edge Geometry Using Roll-off Amount, ROA

SEMI MF26 — Test Methods for Determining the Orientation of a Semiconductive Single Crystal

SEMI MF28 — Test Methods for Minority-Carrier Lifetime in Bulk Germanium and Silicon by Measurement of Photoconductive Decay

SEMI MF42 — Test Methods for Conductivity Type of Extrinsic Semiconducting Materials

SEMI MF81 — Test Method for Measuring Radial Resistivity Variation on Silicon Wafers

SEMI MF84 — Test Method for Measuring Resistivity of Silicon Wafers with an In-Line Four-Point Probe

SEMI MF391 — Test Methods for Minority Carrier Diffusion Length in Extrinsic Semiconductors by Measurement of Steady-State Surface Photovoltage

SEMI MF523 — Practice for Unaided Visual Inspection of Polished Silicon Wafer Surfaces

SEMI MF525 — Test Method for Measuring Resistivity of Silicon Wafers Using a Spreading Resistance Probe

SEMI MF533 — Test Method for Thickness and Thickness of Variation of Silicon Wafers

SEMI MF534 — Test Method for Bow of Silicon Wafers

SEMI MF657 —Test Method for Measuring Warp and Total Thickness Variation on Silicon Wafers by Noncontact Scanning

SEMI MF671 — Test Method for Measuring Flat Length on Wafers of Silicon and Other Electronic Materials

SEMI MF673 — Test Methods for Measuring Resistivity of Semiconductor Slices or Sheet Resistance of Semiconductor Films with a Noncontact Eddy-Current Gage

SEMI MF847 — Test Methods for Measuring Crystallographic Orientation of Flats on Single Crystal Silicon Wafers by X-Ray Techniques

SEMI MF928 — Test Methods for Edge Contour of Circular Semiconductor Wafers and Rigid Disk Substrates

SEMI MF951 — Test Method for Determination of Radial Interstitial Oxygen Variation in Silicon Wafers

SEMI MF978 — Test Method for Characterizing Semiconductor Deep Levels by Transient Capacitance Techniques

SEMI MF1048 — Test Method for Measuring Reflective Total Integrated Scatter

SEMI MF1049 — Practice for Shallow Etch Pit Detection on Silicon Wafers

SEMI MF1152 — Test Method for Dimensions of Notches on Silicon Wafers

SEMI MF1188 — Test Method for Interstitial Oxygen Content of Silicon by Infrared Absorption with Short Baseline

SEMI MF1239 — Test Method for Oxygen Precipitation Characteristics of Silicon Wafers by Measurement of Interstitial Oxygen Reduction

SEMI MF1366 — Test Method for Measuring Oxygen Concentration in Heavily Doped Silicon Substrates by Secondary Ion Mass Spectrometry

SEMI MF1388 — Test Method for Generation Lifetime and Generation Velocity of Silicon Material by Capacitance-Time Measurements of Metal-Oxide-Silicon (MOS) Capacitors

SEMI MF1390 — Test Method for Measuring Warp on Silicon Wafers by Automated Non-contact Scanning

SEMI MF1391 — Test Method for Substitutional Atomic Carbon Content of Silicon by Infrared Absorption

SEMI MF1451 — Test Method for Measuring Sori on Silicon Wafers by Automated Non-contact Scanning

SEMI MF1528 — Test Method for Measuring Boron Contamination in Heavily Doped n-Type Silicon Substrates by Secondary Ion Mass Spectrometry

SEMI MF1530 — Test Method for Measuring Flatness, Thickness, and Total Thickness Variation on Silicon Wafers by Automated Non-contact Scanning

SEMI MF1535 — Test Method for Carrier Recombination Lifetime in Silicon Wafers by Noncontact Measurement of Photoconductivity Decay by Microwave Reflectance

SEMI MF1617 — Test Method for Measuring Surface Sodium, Aluminum, Potassium, and Iron on Silicon and Epi Substrates by Secondary Ion Mass Spectrometry

SEMI MF1619 — Test Method for Measurement of Interstitial Oxygen Content of Silicon Wafers by Infrared Absorption Spectroscopy with p-Polarized Radiation Incident at the Brewster Angle

SEMI MF1726 — Practice for Analysis of Crystallographic Perfection of Silicon Wafers

SEMI MF1727 — Practice for Detection of Oxidation Induced Defects in Polished Silicon Wafers

SEMI MF1809 — Guide for Selection and Use for Etching Solutions to Delineate Structural Defects in Silicon

SEMI MF1982 — Test Methods for Analyzing Organic Contaminants on Silicon Wafer Surfaces by Thermal Desorption Gas Chromatography

SEMI MF2074 — Guide for Measuring Diameter of Silicon and Other Semiconductor Wafers

SEMI T3 — Specification for Wafer Box Labels

SEMI T7 — Specification for Back Surface Marking of Double-sided Polished Wafers with a Two-Dimensional Matrix Code Symbol

Revision History

SEMI M1-0812 (technical revision)

SEMI M1-1111 (technical revision)

SEMI M1-0611 (technical revision)

SEMI M1-0211 (technical revision)

SEMI M1-1109 (technical revision)

SEMI M1-0309E (editorial revision)

SEMI M1-0309 (technical revision)

SEMI M1-0707 (technical revision)

SEMI M1-0307 (technical revision)

SEMI M1-1106 (technical revision)

SEMI M1-1105E (editorial revision)

SEMI M1-1105 (technical revision)

SEMI M1-0305 (complete rewrite to include all subordinate documents)

SEMI M1-0704 (designation update)

SEMI M1-1103 (designation update)

SEMI M1-0302 (technical revision)

SEMI M1-0701E (editorial revision)

SEMI M1-0701 (technical revision)

SEMI M1-0600 (technical revision)

SEMI M1-0200 (technical revision)

SEMI M1-0699 (technical revision)

SEMI M1-0298 (technical revision)

SEMI M1-0997 (technical revision)

SEMI M1-1296 (technical revision)

SEMI M1-96 (technical revision)

SEMI M1-95 (technical revision)

SEMI M1-94 (technical revision)

SEMI M1-93 (technical revision)

SEMI M1-92 (technical revision)

SEMI M1-89 (technical revision)

SEMI M1-85 (technical revision)

SEMI M1-78 (first published)

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