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SEMI P39-0308 - OASIS® – Open Artwork System Interchange Standard

Volume(s): Microlithography
Language: English
Type: Single Standards Download (.pdf)
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SUPERSEDED - Replaced by a newer version.


This standard was technically approved by the global Micropatterning Committee. This edition was approved for publication by the global Audits and Reviews Subcommittee on January 18, 2008. It was available at www.semi.org in February 2008. Originally published March 2004; previously published November 2005.


The purpose of this specification is to define an interchange and encapsulation format for hierarchical integrated circuit mask layout information.

Referenced SEMI Standards


Revision History

SEMI P39-0308 (technical revision)

SEMI P39-1105 (technical revision)

SEMI P39-0304E2 (editorial revision)

SEMI P39-0304E (editorial revision)

SEMI P39-0304 (first published)

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